It takes the average reader to read Simulation of Deposition Processes with PECVD Apparatus by Juergen Geiser
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This book discusses the study of simulating the growth of a thin film by chemical vapor deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.
Simulation of Deposition Processes with PECVD Apparatus by Juergen Geiser is 0 pages long, and a total of 0 words.
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The average oral reading speed is 183 words per minute. This means it takes to read Simulation of Deposition Processes with PECVD Apparatus aloud.
Simulation of Deposition Processes with PECVD Apparatus is suitable for students ages 2 and up.
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